Pfeiffer Vacuum+Fab Solutions, which is represented in Japan by Busch Vacuum Solutions, will present four key products at the exhibition, highlighting advanced vacuum and abatement technologies tailored for semiconductor manufacturing. There will be four featured products on display at the booth.
The UltiDry is a robust multi-stage roots vacuum pump designed for harsh processes. It offers excellent powder handling, high volume flow, and resistance to corrosive gases. The other featured vacuum pump, the HiScroll 46, is an oil-free scroll vacuum pump that is ideal in load lock applications and as a backing pump for turbomolecular vacuum pumps. Thanks to its interior permanent magnet (IPM) motor, the HiScroll generates low heat emissions.
Also on display will be a full-size mock-up of the CT-TW-H thermal-wet hybrid gas abatement system. This solution operates using hydrogen-injected combustion technology – an effective method that selectively destroys exhaust gases generated during semiconductor production. It delivers high uptime, robust environmental performance, and easy maintenance, all of which are critical for sustainable semiconductor manufacturing.
Finally, the ASM 310 leak detector will be demonstrated live at the booth. This tracer gas leak detector offers reliable leak detection in a compact and portable format. It is the lightest in its class at just 21 kg – around 50% less than a standard leak detection unit.
The Busch Group will also participate in the Happy Hour event on Thursday, December 18, and warmly invites all visitors to stop by the booth. Drinks and snacks will be served, providing a chance to relax and enjoy casual conversation in a friendly atmosphere.
SEMICON Japan 2025 offers a valuable opportunity to explore the latest innovations in vacuum and abatement technology. The Busch Group looks forward to welcoming visitors to its booth.
ASM 310 leak detector from Pfeiffer Vacuum+Fab Solutions. Source: Pfeiffer Vacuum+Fab Solutions.